When parts per billion matter, ozone delivers high-purity treatment without introducing carriers, surfactants, or particulate. It does the work and leaves nothing behind.
Used by labs and fabrication facilities where contamination tolerances are measured in parts per billion or trillion.
Sub-ppb purity No residual chemistryCleanrooms, analytical labs, and semiconductor fabrication operations need water and air at purity standards most facilities never approach. Surfactants, carrier solvents, and particulate from conventional cleaning chemistry are themselves the contamination.
Ozone delivers a strong oxidant with no carrier, no surfactant, and no residual ions. After it does its work, it is just oxygen.
Polishes water and surfaces to purity targets that regulated chemistries struggle to meet without introducing their own background.
Combines well with UV polishing and deionization in established ultra-pure water trains.
Reduces total organic carbon to levels demanded by analytical and fabrication processes.
Supports established wafer cleaning chemistries with high-concentration dissolved ozone water.
Improves cleanroom and lab process air purity with no introduced contaminants.
No background ions, no organic carryover, no contribution to your lab blank.
Supports established cleaning chemistries with dissolved ozone water at the rinse and clean stages.
Polish ultra-pure water systems and reduce TOC backgrounds in trace analysis.
Sanitize purified and water-for-injection loops with no residual chemistry to flush.
Tell us about your purity targets, your existing UPW or cleanroom system, and your throughput. We will reply with a sized ozone configuration that fits the train.